Thermal equilibrium concentrations and diffusivities of intrinsic point defects in silicon
Takahisa Okino, Toshitada ShimozakiVolume:
273-274
Year:
1999
Language:
english
Pages:
3
DOI:
10.1016/s0921-4526(99)00540-2
File:
PDF, 78 KB
english, 1999