Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD
M Stöger, A Breymesser, V Schlosser, M Ramadori, V Plunger, D Peiró, C Voz, J Bertomeu, M Nelhiebel, P Schattschneider, J AndreuVolume:
273-274
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0921-4526(99)00568-2
File:
PDF, 159 KB
english, 1999