SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Characterization of EUV irradiation effects on polystyrene derivatives studied by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS)
Yamamoto, Hiroki, Allen, Robert D., Somervell, Mark H., Kozawa, Takahiro, Tagawa, SeiichiVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879412
File:
PDF, 238 KB
english, 2011