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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - The factor affecting LWR and sensitivity in EUV resist material
Han, Joonhee, Shin, Jin Bong, Hong, Yong Hwa, Park, So Jung, Lim, Hyun Soon, Joo, Hyun Sang, Kim, Sam Min, Seo, Dong Chul, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916025
File:
PDF, 2.17 MB
english, 2012