Patterning of GaN by ion implantation-dependent etching

Materials Science and Engineering: B 2001 Vol. 82; Iss. 1-3

Patterning of GaN by ion implantation-dependent etching

S Schiestel, B Molnar, C.A Carosella, D Knies, R.M Stroud, K Edinger
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Volume:
82
Year:
2001
Language:
english
Pages:
3
DOI:
10.1016/s0921-5107(00)00764-9
File:
PDF, 126 KB
english, 2001
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