The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure
Khin Maung Latt, Y.K Lee, S Li, T Osipowicz, H.L SengVolume:
84
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0921-5107(01)00618-3
File:
PDF, 708 KB
english, 2001