Optimisation of a combined transient-ion-drift/rapid thermal annealing process for copper detection in silicon
A. Belayachi, T. Heiser, J.P. Schunck, S. Bourdais, P. Bloechl, A. Huber, A. KempfVolume:
102
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0921-5107(02)00735-3
File:
PDF, 216 KB
english, 2003