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Ostwald ripening of Ge precipitates elaborated by ion implantation in SiO2
C Bonafos, B Garrido, M Lopez, A Perez-Rodriguez, J.R Morante, Y Kihn, G Ben Assayag, A ClaverieVolume:
69-70
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0921-5107(99)00411-0
File:
PDF, 389 KB
english, 2000