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Low temperature Si epitaxy in a vertical LPCVD batch reactor
G Ritter, J. Harrington, B. Tillack, Th. Morgenstern, G.R. Dietze, Z.J. RadzimskiVolume:
73
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0921-5107(99)00464-x
File:
PDF, 180 KB
english, 2000