Low-line edge roughness extreme ultraviolet photoresists of...

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Del Re, Ryan, Passarelli, James, Sortland, Miriam, Cardineau, Brian, Ekinci, Yasin, Buitrago, Elizabeth, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L.
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Volume:
14
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.14.4.043506
Date:
November, 2015
File:
PDF, 2.91 MB
english, 2015
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