SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Characteristics of main chain decomposable STAR polymer for EUV resist
Iwashita, Jun, Allen, Robert D., Somervell, Mark H., Hirayama, Taku, Takagi, Isamu, Matsuzawa, Kensuke, Suzuki, Kenta, Yoshizawa, Sachiko, Konno, Kenri, Yahagi, Masahito, Sato, Kazufumi, Tagawa, SeiicVolume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879349
File:
PDF, 385 KB
english, 2011