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Etch rates of (100), (111) and (110) single-crystal silicon in TMAH measured in situ by laser reflectance interferometry
Elin Steinsland, Terje Finstad, Anders HanneborgVolume:
86
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0924-4247(00)00309-5
File:
PDF, 207 KB
english, 2000