A low-temperature CVD process for silicon carbide MEMS

Sensors and Actuators A: Physical 2002 Vol. 97-98; Iss. none

A low-temperature CVD process for silicon carbide MEMS

Conrad R. Stoldt, Carlo Carraro, W.Robert Ashurst, Di Gao, Roger T. Howe, Roya Maboudian
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Volume:
97-98
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0924-4247(01)00810-x
File:
PDF, 515 KB
english, 2002
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