HF/H2O vapor etching of SiO2 sacrificial layer for large-area surface-micromachined membranes
J. Anguita, F. BrionesVolume:
64
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0924-4247(97)01628-2
File:
PDF, 405 KB
english, 1998