A new process for releasing micromechanical structures in surface micromachining with polysilicon support and LPCVD Si3N4 embedded mask
Zhixiong Xiao, Yilong Hao, Guobing Zhang, Guoying Wu, Zhihong Li, Wenru Chen, Shimei Liu, Ting Li, Tiesong Wang, Yangyuan WangVolume:
72
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0924-4247(98)00231-3
File:
PDF, 1.76 MB
english, 1999