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Influence of anneals in oxygen ambient on stress of thick polysilicon layers
M Fürtsch, M Offenberg, H Münzel, J.R MoranteVolume:
76
Year:
1999
Language:
english
Pages:
8
DOI:
10.1016/s0924-4247(98)00287-8
File:
PDF, 1.54 MB
english, 1999