Tensile testing of SiO2 and Si3N4 films carried out on a...

Tensile testing of SiO2 and Si3N4 films carried out on a silicon chip

Tetsuo Yoshioka, Taeko Ando, Mitsuhiro Shikida, Kazuo Sato
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Volume:
82
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0924-4247(99)00364-7
File:
PDF, 1002 KB
english, 2000
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