Tensile testing of SiO2 and Si3N4 films carried out on a silicon chip
Tetsuo Yoshioka, Taeko Ando, Mitsuhiro Shikida, Kazuo SatoVolume:
82
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0924-4247(99)00364-7
File:
PDF, 1002 KB
english, 2000