Optical properties of Si–O–N–F films as a phase shift mask...

Optical Materials 2003 Vol. 22; Iss. 4

Optical properties of Si–O–N–F films as a phase shift mask material for 157 nm optical lithography

Sung Kwan Kim, Myung Ah Kang, Jung Min Sohn, Songho Kim, Kwangsoo No
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Volume:
22
Year:
2003
Language:
english
Pages:
7
DOI:
10.1016/s0925-3467(02)00370-1
File:
PDF, 302 KB
english, 2003
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