Characterization of α-Fe2O3 thin films deposited by...

Sensors and Actuators B: Chemical 1996 Vol. 34; Iss. 1-3

Characterization of α-Fe2O3 thin films deposited by atmospheric pressure CVD onto alumina substrates

C.C. Chai, J. Peng, B.P. Yan
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Volume:
34
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/s0925-4005(97)80014-7
File:
PDF, 560 KB
english, 1996
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