Anisotropic etching of silicon in a complexant redox alkaline system
Carmen Moldovan, Rodica Iosub, Dan Dascalu, Gheorghe NechiforVolume:
58
Year:
1999
Language:
english
Pages:
12
DOI:
10.1016/s0925-4005(99)00124-0
File:
PDF, 1.07 MB
english, 1999