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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Effects of the statistical fluctuation of PAG and quencher on LWR of ArF resists
Wallow, Thomas I., Hohle, Christoph K., Fujita, Mitsuhiro, Shirakawa, Michihiro, Yamaguchi, ShuheiVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085751
File:
PDF, 502 KB
english, 2015