SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch
Naulleau, Patrick, Anderson, Christopher N., Baclea-an, Lorie-Mae, Chan, David, Denham, Paul, George, Simi, Goldberg, Kenneth A., Hoef, Brian, Jones, Gideon, Koh, Chawon, La Fontaine, Bruno, McClintonVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.848438
File:
PDF, 3.47 MB
english, 2010