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SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems
Hamaker, Henry Chris, Burns, Gary A., Buck, Peter D., Shelden, Gilbert V., Wiley, James N.Volume:
2621
Year:
1995
Language:
english
DOI:
10.1117/12.228185
File:
PDF, 433 KB
english, 1995