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High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma
Makoto Fukawa, Susumu Suzuki, Lihui Guo, Michio Kondo, Akihisa MatsudaVolume:
66
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0927-0248(00)00176-8
File:
PDF, 225 KB
english, 2001