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Inhomogeneities in PECVD deposited a-Si:H films induced by a spacing between substrate and substrate holder
W.G.J.H.M. van Sark, H. Meiling, J. Bezemer, M.B. von der Linden, R.E.I. Schropp, W.F. van der WegVolume:
45
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0927-0248(96)00062-1
File:
PDF, 358 KB
english, 1997