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Preparation of highly conductive p-type μc-Si:H window layer using lower concentration of hydrogen in the rf glow discharge plasma
Jaydeep V. Sali, Varsha D. Panaskar, M.G. Takwale, B.R. Marathe, V.G. BhideVolume:
45
Year:
1997
Language:
english
Pages:
9
DOI:
10.1016/s0927-0248(96)00088-8
File:
PDF, 318 KB
english, 1997