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Raman and XPS characterization of vanadium oxide thin films deposited by reactive RF sputtering
E. Cazzanelli, G. Mariotto, S. Passerini, W.H. Smyrl, A. GorensteinVolume:
56
Year:
1999
Language:
english
Pages:
10
DOI:
10.1016/s0927-0248(98)00135-4
File:
PDF, 140 KB
english, 1999