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Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target
E. Masetti, M.L. Grilli, G. Dautzenberg, G. Macrelli, M. AdamikVolume:
56
Year:
1999
Language:
english
Pages:
11
DOI:
10.1016/s0927-0248(98)00136-6
File:
PDF, 367 KB
english, 1999