Influence of hydrogen dilution on low-temperature polycrystalline silicon formation using RF excitation SiH4/H2 plasma
Yao Ruohe, Lin Xuanying, Wu Pin, Yu Chuying, Shi Wangzhou, Lin KuixunVolume:
62
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0927-0248(99)00152-x
File:
PDF, 142 KB
english, 2000