SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Novel EUV resist materials and process for 20 nm half pitch and beyond
Maruyama, Ken, Ayothi, Ramakrishnan, Hishiro, Yoshi, Inukai, Koji, Shiratani, Motohiro, Kimura, Tooru, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011243
File:
PDF, 879 KB
english, 2013