![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Design for Manufacturability through Design-Process Integration VII - Self-aligned double patterning compliant routing with in-design physical verification flow
Gao, Jhih-Rong, Jawandha, Harshdeep, Atkar, Prasad, Walimbe, Atul, Baidya, Bikram, Rizzo, Olivier, Pan, David Z., Mason, Mark E., Sturtevant, John L.Volume:
8684
Year:
2013
Language:
english
DOI:
10.1117/12.2013245
File:
PDF, 554 KB
english, 2013