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SPIE Proceedings [SPIE SPIE Optics + Optoelectronics - Prague, Czech Republic (Monday 13 April 2015)] Advances in X-ray Free-Electron Lasers Instrumentation III - Optimization of high average power FEL beam for EUV lithography
Biedron, Sandra G., Endo, AkiraVolume:
9512
Year:
2015
Language:
english
DOI:
10.1117/12.2182239
File:
PDF, 619 KB
english, 2015