SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Development of EUV resists based on various new materials
Oizumi, Hiroaki, Matsumaro, Kazuyuki, Santillan, Julius, Shiraishi, Gousuke, Kaneyama, Koji, Matsunaga, Kentaro, Itani, Toshiro, Allen, Robert D.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846429
File:
PDF, 11.59 MB
english, 2010