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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Evaluation of TER-SYSTEM resist for 193-nm imaging
Johnson, Donald W., Egbe, Matthew I., Chen, Cindy X., Lin, Lin, Liao, Yihua, Bukasa, Ngalula C., Suzuki, Yasuhiro, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275900
File:
PDF, 1.43 MB
english, 1997