SPIE Proceedings [SPIE Microelectronic Manufacturing '99 -...

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SPIE Proceedings [SPIE Microelectronic Manufacturing '99 - Santa Clara, CA (Wednesday 22 September 1999)] Microelectronic Device Technology III - Formation of heavily boron-doped nanolayer in silicon by powerful ion irradiation

Kokhanenko, Andrej P., Korotaev, Aleksander G., Voitsekhovskii, Aleksander V., Grushin, Ivan, Opekunov, Mikhail S., Remnev, Gennady E., Burnett, David, Tsuchiya, Toshiaki
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Volume:
3881
Year:
1999
Language:
english
DOI:
10.1117/12.360564
File:
PDF, 355 KB
english, 1999
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