SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
Klein, C., Platzgummer, E., Loeschner, H., Gross, G., Dolezel, P., Tmej, M., Kolarik, V., Klingler, W., Letzkus, F., Butschke, J., Irmscher, M., Witt, M., Pilz, W., Schellenberg, Frank M.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772726
File:
PDF, 1.54 MB
english, 2008