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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - SiOxNy:H, high-performance antireflective layer for current and future optical lithography
Ogawa, Tohru, Nakano, Hiroyuki, Gocho, Tetsuo, Tsumori, Toshiro, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175463
File:
PDF, 723 KB
english, 1994