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(Ba,Sr)TiO3 thin film growth in a batch processing MOCVD reactor
S. Regnery, P. Ehrhart, F. Fitsilis, R. Waser, Y. Ding, C.L. Jia, M. Schumacher, F. Schienle, H. JuergensenVolume:
24
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/s0955-2219(03)00235-8
File:
PDF, 400 KB
english, 2004