SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology
Sheehan, Michael T., Allen, Robert D., Somervell, Mark H., Farnham, William B., Chambers, Charles R., Tran, Hoang V., Okazaki, Hiroshi, Brun, Yefim, Romberger, Matthew L., Sounik, James R.Volume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.882960
File:
PDF, 971 KB
english, 2011