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Interfacial and electrical characterization of HfO 2 /Al 2 O 3 /InAlAs structures
Wu, Li-fan, Zhang, Yu-ming, Lu, Hong-liang, Zhang, Yi-menVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.110303
Date:
November, 2015
File:
PDF, 820 KB
english, 2015