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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Ellipsometry studies of the kinetic of deprotection of thin 193 nm positive tone resist film
Ridaoui, H., Derrough, S., Sourd, C., Trouve, H., Pikon, A., Tortai, J. H., Henderson, Clifford L.Volume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.773916
File:
PDF, 222 KB
english, 2008