SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Environmentally friendly natural materials-based photoacid generators for next-generation photolithography
Cho, Youngjin, Allen, Robert D., Somervell, Mark H., Ouyang, Christine Y., Krysak, Marie, Sun, Wenjie, Gamez, Victor, Sierra-Alvarez, Reyes, Ober, Christopher K.Volume:
7972
Year:
2011
Language:
english
DOI:
10.1117/12.879816
File:
PDF, 630 KB
english, 2011