The variation of the enhanced PL efficiency of Y2O3:Eu3+...

Microelectronic Engineering 2015 / 03 Vol. 136

The variation of the enhanced PL efficiency of Y2O3:Eu3+ phosphor films with the height to the ZrO2 nanoparticle-assisted 2D PCL by reverse nano-imprint lithography

Park, Chulkyun, Kim, Hyojun, Park, In-Sung, Ko, Ki-Young, Kim, Ki-Kang, Lee, Byoung Hun, Ahn, Jinho
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Volume:
136
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.03.035
Date:
March, 2015
File:
PDF, 898 KB
english, 2015
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