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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Advanced Bilayer Resist Process With Optimized PMGT Formulation
Brunsvold, W., Lyons, C., Conley, W., Crockatt, D., Skinner, M., Uptmor, A., Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953041
File:
PDF, 11.13 MB
english, 1989