A study of the effect of the structure of plasma-chemical silicon nitride on its masking properties
Garmash, V. I., Egorkin, V. I., Zemlyakov, V. E., Kovalchuk, A. V., Shapoval, S. Yu.Volume:
49
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782615130084
Date:
December, 2015
File:
PDF, 199 KB
english, 2015