![](/img/cover-not-exists.png)
Characterization of Boron Diffusion Phenomena According to the Specific Resistivity of N-Type Si Wafer
Lee, Woo-Jin, Choi, Chel-Jong, Park, Gye-Choon, Yang, O-BongVolume:
16
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.11945
Date:
February, 2016
File:
PDF, 422 KB
english, 2016