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[IEEE 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Washington DC, USA (2015.9.9-2015.9.11)] 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Thermal modeling of metal oxides for highly scaled nanoscale RRAM
Deshmukh, Sanchit, Islam, Raisul, Chen, Clare, Yalon, Eilam, Saraswat, Krishna C., Pop, EricYear:
2015
Language:
english
DOI:
10.1109/SISPAD.2015.7292314
File:
PDF, 513 KB
english, 2015