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UV-pretreatment- and near-infrared rapid thermal annealing-enhanced dehydrogenation for a-Si:H thin films at 400°C
Ji, Sanghyun, Hwang, Chi-Sun, Jeong, Pilseong, Lee, Sungyong, Lee, Kwang SoonVolume:
598
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.12.022
Date:
January, 2016
File:
PDF, 687 KB
english, 2016