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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Characterization of across-device linewidth variation (ADLV) for 65-nm logic SRAM using CDSEM and linewidth roughness algorithms
Chu, W., Radens, C., Dirahoui, B., Grauer, I., Samuels, D., Credendino, S., Nomura, A., Cornell, R., Archie, Chas N.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.663446
File:
PDF, 1.21 MB
english, 2006