SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Design for Manufacturability through Design-Process Integration - Context-specific leakage and delay analysis of a 65nm standard cell library for lithography-induced variability
Tsien, Darsun, Wang, Chien Kuo, Ran, Yajun, Hurat, Philippe, Verghese, Nishath, Wong, Alfred K. K., Singh, Vivek K.Volume:
6521
Year:
2007
Language:
english
DOI:
10.1117/12.712281
File:
PDF, 503 KB
english, 2007